Molecular Formula: C2H6Cl2Si
Molecular weight: 129.06054
InChi: InChI=1S/C2H6Cl2Si/c1-5(2,3)4/h1-2H3
InChi Key: LIKFHECYJZWXFJ-UHFFFAOYSA-N
SMILES: [Si](Cl)(Cl)(C)C
Chemical Name
Cl2SiMe2
dichlorodimethylsilane
dimethyl-dichloro-silane
dimethyl-dichlorosilane
dimethyldichlorosilane
Me2SiCl2
Cl2SiMe2
dichlorodimethylsilane
dimethyl-dichloro-silane
dimethyl-dichlorosilane
dimethyldichlorosilane
Me2SiCl2
Authors of compound
Kotora, Martin
Stambasky, Jan
Michl, Josef
Takahashi, Tamotsu
Nakajima, Kiyohiko
Tsai, Fu-Yu
Li, Yanzhong
Ura, Yasuyuki
Paleta, Oldrich
Kvicala, Jaroslav
Skalicky, Martin
Magnera, Thomas F.
David, Donald E.
West, Robert
Vancik, Hrvoj
Raabe, Gerhard
Michalczyk, Michael J.
Schoeberl, Ulrich
Harrison, Robin M.
Fleischer, Frank
Pflug, Jodi L.
Schwab, Peter F. H.
Meng, Xiangsheng
Lipiak, Dariusz
Noll, Bruce C.
Allured, Viloya S.
Rudalevige, Trevor
Lee, Stephen
Imhof, Roman
Antic, Dean
Stambasky, Jan
Michl, Josef
Takahashi, Tamotsu
Nakajima, Kiyohiko
Tsai, Fu-Yu
Li, Yanzhong
Ura, Yasuyuki
Paleta, Oldrich
Kvicala, Jaroslav
Skalicky, Martin
Magnera, Thomas F.
David, Donald E.
West, Robert
Vancik, Hrvoj
Raabe, Gerhard
Michalczyk, Michael J.
Schoeberl, Ulrich
Harrison, Robin M.
Fleischer, Frank
Pflug, Jodi L.
Schwab, Peter F. H.
Meng, Xiangsheng
Lipiak, Dariusz
Noll, Bruce C.
Allured, Viloya S.
Rudalevige, Trevor
Lee, Stephen
Imhof, Roman
Antic, Dean
Articles
Kotora, Martin;
Takahashi, Tamotsu;
Nakajima, Kiyohiko;
Tsai, Fu-Yu;
Li, Yanzhong;
Ura, Yasuyuki, Preparation of Sn-, Ge-, and Si-heterocycles from zirconacycles. Heterocycles 2000, 52(3), 1171 - 1189.
Stambasky, Jan;
Paleta, Oldrich;
Kvicala, Jaroslav;
Skalicky, Martin, Preparation of fluorohalomethylmagnesium halides using highly active magnesium metal and their reactions. Journal of Fluorine Chemistry 2005, 126(9-10), 1390 - 1395, 10.1016/j.jfluchem.2005.07.016 
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Michl, Josef;
West, Robert;
Vancik, Hrvoj;
Raabe, Gerhard;
Michalczyk, Michael J., Dimethylsilylene: A Trisilane and a Geminal Diazide as New Photochemical Precursors. Evidence for an Absorption Maximum near 450 nm. Journal of the American Chemical Society 1985, 107(13), 4097 - 4098, 10.1021/ja00299a067 .
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Michl, Josef;
Magnera, Thomas F.;
Schoeberl, Ulrich;
Harrison, Robin M.;
Fleischer, Frank;
Pflug, Jodi L.;
Schwab, Peter F. H.;
Meng, Xiangsheng;
Lipiak, Dariusz;
Noll, Bruce C.;
Allured, Viloya S.;
Rudalevige, Trevor;
Lee, Stephen, Toward a hexagonal grid polymer: Synthesis, coupling, and chemically reversible surface-pinning of the star connectors, 1,3,5- CH(CBHCX). Journal of the American Chemical Society 1997, 119(17), 3907 - 3917, 10.1021/ja963331d .
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Michl, Josef;
David, Donald E.;
Imhof, Roman;
Antic, Dean, Conformational effects in photoelectron spectra of tetrasilanes. Journal of Physical Chemistry A 1997, 101(25), 4579 - 4586.